Performance
- Surface resistance
- Transparency & appearance
- Contact angle
- Adhesion
SEMICONDUCTOR ESD PROCESSING
From sample validation to repeatable production conditions.
Precision spray coating, dip coating and planar coating for semiconductor consumables, precision components, transparent substrates and complex workpieces.

PROCESS ENGINEERING
We define controls for surface resistance, appearance, adhesion and batch consistency around the substrate, pretreatment, coating, drying and fixture conditions. Sample approval and process records support repeatable production.
CORE PROCESS
The process is selected around workpiece geometry, substrate behavior, target performance and acceptance criteria.
Functional coverage for complex geometry, corners and selected areas with controlled film thickness, coverage and surface resistance.
Continuous coating of inner and outer surfaces, grooves and tubular structures for special geometries and batch processing.
Uniform antistatic coating for flat substrates with balanced transparency, appearance and batch stability.
APPLICATION SYSTEM
Functional surface processing for risks related to charge accumulation, particle attraction and surface failure.
Explore Applications
FOUP · FOSB · Cassette
Engineering plastics · Precision parts
IC Tray · Carrier Tape
PET · PC · PMMA
PROCESS VALIDATION
Performance, appearance and process conditions are validated together to create a traceable project baseline.
Confirmed to project specifications
Wetting and coating-property evaluation
Haze, runs, scratches and adhesion
SDS information aligned with GHS
PROJECT DELIVERY
Requirements, process, validation and delivery conditions are established together.
TECHNICAL INQUIRY
Share the substrate, drawing, target resistance, test method and estimated quantity.
Submit a Technical Request